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Alfred Larsson. Portrait.

Alfred Larsson

Postdoctoral fellow

Alfred Larsson. Portrait.

In situ quantitative analysis of electrochemical oxide film development on metal surfaces using ambient pressure X-ray photoelectron spectroscopy : Industrial alloys

Author

  • Alfred Larsson
  • Konstantin Simonov
  • Josefin Eidhagen
  • Andrea Grespi
  • Xiaoqi Yue
  • Huajie Tang
  • Anna Delblanc
  • Mattia Scardamaglia
  • Andrey Shavorskiy
  • Jinshan Pan
  • Edvin Lundgren
Show all

Summary, in English

Ambient Pressure X-ray Photoelectron Spectroscopy combined with an electrochemical setup is used to study, in situ, the electrochemical oxide growth on an industrial Ni-Cr-Mo alloy. The native oxide film was characterized in vacuum and in water vapor at 17 mbar, and was found to be 11.4 Å thick and rich in Cr3+. In 0.1 M NaCl electrolyte, anodic growth of the oxide film at potentials up to 700 mV vs Ag/AgCl nearly doubled the thickness of the oxide film. Moreover, a transformation of the oxide composition occurred, as the oxide became enriched in Mo6+ with a chemical fingerprint more like that of pure MoO3. Both thermodynamics and kinetics of the oxidation of the alloying elements dictate the oxide film growth and composition. Furthermore, we develop the quantitative analysis of oxide composition and thickness to take into account the attenuation through the liquid water and the water vapor atmosphere. Finally, we discuss the differences between ex situ, UHV, in situ, and operando measurements. Our approach is robust, fast, simple, and suitable for systematically probing metal surfaces after aqueous exposure and electrochemical polarization, which promises wide applications for studies of solid–liquid interfaces in corrosion, batteries, fuel cells, and electrocatalysis.

Department/s

  • LU Profile Area: Light and Materials
  • LTH Profile Area: Nanoscience and Semiconductor Technology
  • Synchrotron Radiation Research
  • NanoLund: Centre for Nanoscience
  • MAX IV Laboratory
  • LTH Profile Area: Photon Science and Technology

Publishing year

2023

Language

English

Publication/Series

Applied Surface Science

Volume

611

Document type

Journal article

Publisher

Elsevier

Topic

  • Materials Chemistry
  • Atom and Molecular Physics and Optics

Status

Published

ISBN/ISSN/Other

  • ISSN: 0169-4332